Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room X-Ray rocking curve available

X-Ray rocking curve available

Material:  LiNiCoMnO2

A 110 - 220V AC (50/60 Hz) to 24VDC NRTL certified power adapter is included

50)E18/cc @77K

We don't guarantee the crimping quality if other brand cells

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room X-Ray rocking curve availableSilicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 10x5x0. 5mm Edge: CNC Ground Surface Quality: 60 40 or beer Non effective Area: